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Investigation on total scattering at 157 nm and 193 nm [4099-09]
Calibration requirements for identifying and sizing wafer defects by scanner measurements [4099-38]
Characteristics of tantalum oxynitride films prepared by rf magnetron sputtering [4099-30]
Standardization in optics characterization (Invited Paper) [4099-14]
X-ray study of surfaces and interfaces [4449-31]
Effects of particle shape on particle identification and scatter predictions [4449-18]
X-ray study of the roughness of surfaces and interfaces [4099-12]
Variable angle spectroscopic ellipsometry in the vacuum ultraviolet (Invited Paper) [4099-24]
2D-area/3D-volume holographic optical storage nanotechnology [4099-22]
New procedure for the optical characterization of high-quality thin films [4099-16]
Optical microscopy at sub-0.1-mum resolution for semiconductor applications [4099-03]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]
Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]