Quasi-confocal extended field surface sensing [4449-23]
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Microstructure of thin films: correlation with laser damage threshold [4449-35]
Use of light scatter signals to identify particle material (Invited Paper) [4449-17]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Effects of particle shape on particle identification and scatter predictions [4449-18]
Measurement of absorptance of optical coatings for F~2 lithography [4449-02]