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semiconductor
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keywords:(semiconductor industries)
2D-area/3D-volume holographic optical storage nanotechnology [4099-22]
Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]
Accurate sizing of deposited PSL spheres from light scatter measurements [4449-19]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
Calibration requirements for identifying and sizing wafer defects by scanner measurements [4099-38]
Calibration tool for a CCD-camera-based vision system [4099-19]
Characteristics of tantalum oxynitride films prepared by rf magnetron sputtering [4099-30]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
Effects of particle shape on particle identification and scatter predictions [4449-18]
Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]
Evaluating optical and supersmooth surface using AFM in optical manufacturing technology [4099-07]
Fast-scanning ellipsometry for thin film characterization [4099-39]