Abstract We have demonstrated a compact interferometric lithography nanopattern-ing tool based on an amplitude division interferometer and a 46.9 nm wavelength desk-top size capillary discharge laser. The system is designed to print arrays of lines, holes, and dots with sizes below 100 nm on high resolution photoresists for the fabrication of arrays of nanostructures with physical and biological applications. The future combination of this amplitude division interferometer with high repetition rate table-top lasers operating at shorter wavelengths should allow the printing of arrays with features size only limited by the photoresist resolution in a table top set-up.
Interferometric Lithography with a Desk-Top Size Soft X-Ray Laser
2009-01-01
6 pages
Aufsatz/Kapitel (Buch)
Elektronische Ressource
Englisch
Capillary Discharge , Lithography Tool , Extreme Ultraviolet Lithography , Spatial Coherence Length , Interferometric Lithography Physics , Optics and Electrodynamics , Atomic, Molecular, Optical and Plasma Physics , Quantum Optics , Laser Technology, Photonics , Atoms and Molecules in Strong Fields, Laser Matter Interaction , Plasma Physics
Interferometric Lithography with a Desk-Top Size Soft X-Ray Laser
British Library Conference Proceedings | 2009
|Interferometric Lithography at 47nm with a Table-Top EUV Laser
British Library Conference Proceedings | 2004
|Advanced laser driver for soft x-ray projection lithography [2206-67]
British Library Conference Proceedings | 1994
|