Abstract We have demonstrated a compact interferometric lithography nanopattern-ing tool based on an amplitude division interferometer and a 46.9 nm wavelength desk-top size capillary discharge laser. The system is designed to print arrays of lines, holes, and dots with sizes below 100 nm on high resolution photoresists for the fabrication of arrays of nanostructures with physical and biological applications. The future combination of this amplitude division interferometer with high repetition rate table-top lasers operating at shorter wavelengths should allow the printing of arrays with features size only limited by the photoresist resolution in a table top set-up.


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    Titel :

    Interferometric Lithography with a Desk-Top Size Soft X-Ray Laser


    Beteiligte:
    Wachulak, P. W. (Autor:in) / Marconi, M. C. (Autor:in) / Rockward, W. (Autor:in) / Hill, D. (Autor:in) / Anderson, E. H. (Autor:in) / Menoni, C. S. (Autor:in) / Rocca, J. J. (Autor:in)

    Erschienen in:

    X-Ray Lasers 2008 ; 7 ; 495-500


    Erscheinungsdatum :

    2009-01-01


    Format / Umfang :

    6 pages





    Medientyp :

    Aufsatz/Kapitel (Buch)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch




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