A high-breakdown-voltage n+-GaAs/δ (p+)-GaInP/n-GaAs camel-gate field-effect transistor with the triple-step doped-channel has been successfully fabricated and demonstrated. Experimentally, the high gate turn-on voltage of 1.6 V at a gate current of 1 mA/mm and a very high breakdown voltage of 40 V with the low gate leakage current of 400 μA/mm are obtained. The measured transconductance is 145 mS/mm with the current gain cut-off frequency fT of 17 GHz and the maximum oscillation frequency fmax of 33 GHz for a 1×100 um2 device. Consequently, based on the remarkable experimental results, the studied device shows a promise for high-power circuit applications.


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    Titel :

    A High-Breakdown Voltage n+-GaAs/δ (p+)-GaInP/n-GaAs Heterojunction Camel-Gate Transistor for Power System Applications


    Weitere Titelangaben:

    Sae Technical Papers


    Beteiligte:
    Pan, H. J. (Autor:in) / Chen, J. Y. (Autor:in) / Yu, K. H. (Autor:in) / Feng, S. C. (Autor:in) / Liu, W. C. (Autor:in) / Wang, W. C. (Autor:in) / Chang, W. L. (Autor:in)

    Kongress:

    34th Intersociety Energy Conversion Engineering Conference ; 1999



    Erscheinungsdatum :

    02.08.1999




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch






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