In direct contact with untreated, undiluted exhaust gases, the resistance of the thin film semiconductor tin oxide NOx sensor (TFS sensor) shows strong dependence on engine air-to-fuel ratio (A/F). The peak resistance of the sensor occurs around 17–18 A/F. From frequency response tests, the sensor response time constant is estimated to be ~1.1 seconds. A chemiluminiscent NOx analyzer (CLA) is used to measure the NO and NOx concentrations in the exhaust gases, while the NO2 content is estimated from [NOx] - [NO] measurements. Peak concentrations of NO and NO2 occur at 15 A/F and 17–18 A/F, respectively. The NO2 peak position is very close to the sensor resistance peak position. While EGR drastically reduces the NO content, it shows a smaller effect on the sensor resistance, especially around the stoichiometric condition.


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    Titel :

    Thin Film Semiconductor NOx Sensor


    Weitere Titelangaben:

    Sae Technical Papers


    Beteiligte:

    Kongress:

    1980 Automotive Engineering Congress and Exposition ; 1980



    Erscheinungsdatum :

    1980-02-01




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Thin film semiconductor NOx sensor

    Shih-Chia Chang | Tema Archiv | 1980


    Thin film semiconductor NOx sensor

    Chang,S.C. / General Motors Res.Lab.,US | Kraftfahrwesen | 1980


    Thin Film Temperature Sensor

    B. W. Kennedy / K. Wiemer / C. Karstendiek et al. | NTIS | 1968



    Thin film oxygen partial pressure sensor

    Wortmann, J. J. | TIBKAT | 1972