The present generation of industrial ultraviolet light (UV) excimer lasers are being used in a growing number of demanding production and prototype application work that had previously been beyond the capabilities of such thermal sources as CO2, operating at 10.6 μm, or Nd:YAG and Nd:Glass, operating at 1.06 μm range. The high photon energy and the very short duration of the excimer pulses can efficiently initiate photochemical and/or photothermal surface reactions leading to precision micromachining, indelible marking, and microstructure modification.


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    Titel :

    Excimer Laser Micromachining/Marking


    Weitere Titelangaben:

    Sae Technical Papers


    Beteiligte:

    Kongress:

    Aerospace Technology Conference and Exposition ; 1989



    Erscheinungsdatum :

    01.09.1989




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch


    Schlagwörter :


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