Study of an argon-hydrogen RF inductive thermal plasma torch used for silicon deposition by optical emission spectroscopy
Solar energy materials & solar cells ; 72 , 1
2002
Aufsatz (Zeitschrift)
Englisch
Plasma deposition of thin film silicon: kinetics monitored by optical emission spectroscopy
Online Contents | 2002
|NTIS | 1994
|Online Contents | 1995