More mirrors provide additional wavelength selectivity. Four-mirror x-ray and extreme-ultraviolet monochromator provides narrower wavelength passband than devices described in "Compact X-Ray and Extreme Ultraviolet Monochromator" (MFS-28499) and "Scanning X-Ray or Extreme Ultraviolet Monochromator" (MFS-28492). Relies on Bragg reflection from two identical parallel multilayer mirrors to extract narrow-spectrum x-ray or extreme-ultraviolet beam from broad-spectrum input beam.


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    Titel :

    Four-Mirror X-Ray And Extreme-Ultraviolet Monochromator


    Beteiligte:

    Erschienen in:

    Erscheinungsdatum :

    1991-06-01



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :





    Extreme Ultraviolet Lithography

    Stulen, R. H. / Sweeney, D. W. | British Library Online Contents | 1999


    Extreme ultraviolet lithography

    Bokor, J. / Optical Society of America | British Library Conference Proceedings | 1997