Prewetting surface overcomes problem of nonuniformity of etching often occuring in polycrystalline films at PbS and PbSe. Believed prewetting causes etchant to attack film uniformly. Because process involves wet chemistry, inexpensive and easy to use.


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    Titel :

    Uniform Etching For Polycrystalline Photoconductor Films


    Beteiligte:
    Barrett, John (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    1988-11-01



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :


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