Prewetting surface overcomes problem of nonuniformity of etching often occuring in polycrystalline films at PbS and PbSe. Believed prewetting causes etchant to attack film uniformly. Because process involves wet chemistry, inexpensive and easy to use.
Uniform Etching For Polycrystalline Photoconductor Films
NASA Tech Briefs ; 12 , 10
1988-11-01
Sonstige
Keine Angabe
Englisch
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