Chemical etching for automatic processing of integrated circuits is discussed. The wafer carrier and loading from a receiving air track into automatic furnaces and unloading onto a sending air track are included.


    Zugriff

    Zugriff über TIB

    Verfügbarkeit in meiner Bibliothek prüfen


    Exportieren, teilen und zitieren



    Titel :

    Chemical Etching for Automatic Processing of Integrated Circuits


    Beteiligte:
    B. W. Kennedy (Autor:in)

    Erscheinungsdatum :

    1981


    Format / Umfang :

    20 pages


    Medientyp :

    Report


    Format :

    Keine Angabe


    Sprache :

    Englisch




    Etching Integrated Circuits

    Kennedy, B. W. | NTRS | 1983


    Automatic Parametric Testing Of Integrated Circuits

    Jennings, Glenn A. / Pina, Cesar A. | NTRS | 1989



    Chemical etching plant doubles

    Emerald Group Publishing | 2001


    Etched Facet Semiconductor Resonators Fabricated by Reactive Ion Beam Etching for Micro-Photonic Integrated Circuits

    IEEE / Lasers and Electro-Optics Society | British Library Conference Proceedings | 1995