For abstract, see NSA 30 09, number 26177.
Reactor Designs for the Chemical Vapor Deposition of Epitaxial GAAS/sub 1-X/p/sub X/
1973
30 pages
Report
Keine Angabe
Englisch
HIGH EFFICIENCY EPITAXIAL CHEMICAL VAPOR DEPOSITION (CVD) REACTOR
Europäisches Patentamt | 2016
|Chemical-vapor-deposition reactor
NTRS | 1979
|