ZnO:Al/p-Si heterojunctions were fabricated by rf magnetron sputtering of ZnO films onto p-type (100) Si wafer substrates. The structural and electrical properties of the heterojunctions were investigated by current-voltage (I-V) and capacitance-voltage (C-V) measurements. C-V results indicate an abrupt interface and a band bending of 0.35 eV in the silicon. The dark forward current density-voltage-temperature (J-V-T) characteristics were measured and analysed to determine the dominant current transport mechanism in the heterojunction. Our experiments suggest that the dark forward current is dominated by a multi-step tunneling process in the silicon space charge region, whereas the reverse current is found to be mainly due to thermal carrier generation in this region.


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    Titel :

    Heterojunction properties of ZnO:Al/p-Si prepared by rf magnetron sputtering


    Beteiligte:
    Dengyuan Song, (Autor:in) / Baozeng Guo, (Autor:in) / Aberle, A.G. (Autor:in)


    Erscheinungsdatum :

    01.01.2002


    Format / Umfang :

    221194 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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