Low-emissivity (Low-E) films, which have low transparence in near infrared region, are prepared by RF magnetron reactive sputtering and DC sputtering in turn as the structure of air/TiO2/Ti/Ag/TiO2/on the glass. Titanium layer protection Ag layer from being oxidized is observed. The transmittance of Low-E films was measured by spectrophotometer. The Low-E films can get a best transmittance, while the thickness of Titanium layer is about 1 nanometer. In the visible region (380nm-780nm), the highest transmittance is up to 82.4%, and the average transmittance is 75%. In the near infrared region(780nm-2500nm), the average transmittance is 16.2%.


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    Titel :

    A new low-emissivity films Prepared by Magnetron Sputtering


    Beteiligte:
    Shu-rong, Dong (Autor:in) / De-miao, Wang (Autor:in)


    Erscheinungsdatum :

    01.09.2006


    Format / Umfang :

    1191651 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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