We demonstrate that extremely thin, i.e., /spl sim/2-3/spl mu/m, single-crystal films of LiNbO/sub 3/ can be formed on a wafer using patterned ion-implantation followed by chemical etching. Control of the membrane thickness and its waveguiding properties are demonstrated.


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    Titel :

    Extremely thin, single-crystal films of LiNbO/sub 3/ fabricated using localized He+ ion-implantation


    Beteiligte:
    Djukic, D. (Autor:in) / Izuhara, T. (Autor:in) / Roth, R.M. (Autor:in) / Osgood, R.M. (Autor:in) / Bakhru, S. (Autor:in) / Bakhru, H. (Autor:in)


    Erscheinungsdatum :

    01.01.2005


    Format / Umfang :

    1494299 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch




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