The use of dual laser pulses, a lithium plasma source produces unambiguously defined line emission at 13.5 nm with almost no off-band components, which minimize unnecessary heating of EUV optics. A plasma hydrodynamic calculation evaluated the plasma expansion time of 80 ns, within which the plasma density decreased to the critical density of the 1064-nm laser pulse.


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    Titel :

    Enhancement of extreme ultraviolet emission from a laser-produced-lithium plasma by use of dual laser pulses


    Beteiligte:
    Higashiguchi, T. (Autor:in) / Rajyaguru, C. (Autor:in) / Koga, M. (Autor:in) / Kawasaki, K. (Autor:in) / Sasaki, W. (Autor:in) / Kubodera, S. (Autor:in)


    Erscheinungsdatum :

    01.01.2005


    Format / Umfang :

    199315 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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