Road-maps used by the semiconductor industry for device and circuit fabrication in United States and Japan have set targets for 0.1 micron design in general production by the year 2007. The need for increased temporal resolution on nanometric structures has led us to investigate the use of a scanning force microscope (SFM) with the added capability of picosecond-time-resolved waveform measurement. With this tool we are able to measure both nanometer dimensions and picosecond durations using a single probe.
An ultrafast-ultrafine scanning force photoconductive probe
01.01.1995
381519 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
An Ultrafast-Ultrafine Scanning Force Photoconductive Probe
British Library Conference Proceedings | 1995
|British Library Online Contents | 1996
|Ultrafast Scanning Probe Microscopy
British Library Conference Proceedings | 1993
|Ultrafast Scanning Probe Microscopy
IEEE | 1993
|Picosecond Photoconductive Probe
British Library Conference Proceedings | 1996
|