We have used a metastable argon beam to expose gold-coated silicon substrates covered with a self assembled monolayer (SAM) resist. The substrates have been covered with a patterned mask, with features of 10 /spl mu/m size, and exposed to the atomic beam. Subsequent etching revealed negative contrast patterns, consistent with the formation of a negative contamination resist in the SAM, which we attribute to background pump oil vapour. Metastable dosages of 9/spl times/10/sup 14/ atoms cm/sup -2/ and exposure times < 1 hr have been sufficient to produce reliable negative resists.


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    Titel :

    Contamination resists in metastable atom lithography


    Beteiligte:
    Baker, M. (Autor:in) / Palmer, A.J. (Autor:in) / Sang, R.T. (Autor:in)


    Erscheinungsdatum :

    01.01.2002


    Format / Umfang :

    298322 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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