In this work, diffractive microlenses were fabricated in GaN-based material by using gravy-level mask and inductively coupled plasma etching technique. We also propose to insert the GaN/AlN anti-reflection thin films in the microlenses to enhance the ultraviolet/visible rejection ratio. Due to high transparency of GaN and AlN in UV, the microlenses can be potentially used in the UV micro-optics system such as solar-blind detection applications. In the design example of this work, the structure may enhance the ultraviolet/visible rejection to be 10/sup 2/.


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    Titel :

    GaN diffractive microlenses for UV micro-optics system


    Beteiligte:
    Hou, C.C. (Autor:in) / Li, M.H. (Autor:in) / Chen, C.C. (Autor:in) / Sheu, J.K. (Autor:in) / Chang, J.Y. (Autor:in) / Chi, G.C. (Autor:in) / Chuck Wu, (Autor:in) / Cheng, W.T. (Autor:in) / Yeh, J.H. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    77575 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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