In this work, diffractive microlenses were fabricated in GaN-based material by using gravy-level mask and inductively coupled plasma etching technique. We also propose to insert the GaN/AlN anti-reflection thin films in the microlenses to enhance the ultraviolet/visible rejection ratio. Due to high transparency of GaN and AlN in UV, the microlenses can be potentially used in the UV micro-optics system such as solar-blind detection applications. In the design example of this work, the structure may enhance the ultraviolet/visible rejection to be 10/sup 2/.
GaN diffractive microlenses for UV micro-optics system
2003-01-01
77575 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
GaN diffractive microlenses for UV micro-optics system
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