In this work, a technique for achieving double face, sub-micron and 2-D reversed domain patterns is proposed, in congruent r-cut LN crystals. This technique is based on resist patterning the samples by interference photolithography followed by an electric field overpoling process.
Double face two-dimensional domain engineering in congruent lithium niobate
2005-01-01
1007792 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
Photorefractivity of Hafnium-Doped Congruent Lithium Niobate Crystals
British Library Conference Proceedings | 2005
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