In this work, a technique for achieving double face, sub-micron and 2-D reversed domain patterns is proposed, in congruent r-cut LN crystals. This technique is based on resist patterning the samples by interference photolithography followed by an electric field overpoling process.


    Zugriff

    Zugriff prüfen

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    Double face two-dimensional domain engineering in congruent lithium niobate


    Beteiligte:
    Grilli, S. (Autor:in) / Ferraro, P. (Autor:in) / Sansone, L. (Autor:in) / Paturzo, M. (Autor:in) / De Nicola, S. (Autor:in) / Finizio, A. (Autor:in) / Pierattini, G. (Autor:in) / De Natale, P. (Autor:in)


    Erscheinungsdatum :

    2005-01-01


    Format / Umfang :

    1007792 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



    Photorefractivity of hafnium-doped congruent lithium-niobate crystals

    Cristiani, I. / Razzari, L. / Minzioni, P. et al. | IEEE | 2005


    Photorefractivity of Hafnium-Doped Congruent Lithium Niobate Crystals

    Minzioni, P. | British Library Conference Proceedings | 2005


    Photorefractivity of hafnium-doped congruent lithium niobate crystals

    Minzioni, P. / Razzari, L. / Cristiani, I. et al. | IEEE | 2005


    Schlieren imaging of inverted domains in congruent lithium niobate

    Paturzo, M. / Ferraro, P. / Grilli, S. et al. | IEEE | 2005


    Schlieren imaging of inverted domains in congruent lithium niobate

    Paturzo, M. / Ferraro, P. / Grilli, S. et al. | IEEE | 2005