A semiconductor device includes a semiconductor substrate, a device layer over the semiconductor substrate, a first color filter in a top surface of the device layer and adjacent to an edge of the device layer, and a second color filter in the top surface of the device layer. The second color filter has substantially the same thickness and the same color as the first color filter.
CMOS IMAGE SENSOR STRUCTURE WITH CROSSTALK IMPROVEMENT
2019-05-02
Patent
Elektronische Ressource
Englisch
IPC: | B64B LIGHTER-THAN-AIR AIRCRAFT , Luftfahrzeuge leichter als Luft |
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