Optical Lithography in the Extreme UV: As the number of transistors on a chip continues to increase, the industry's shrinking feature size engineers. Extreme Ultraviolet lithography can lead to a more-than-tenfold decrease in wavelength, translating to a startling leap in performance
OPTICS AND PHOTONICS NEWS ; 18 , 10 ; 34-39
2007-01-01
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC: | 621.36 |
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