Characteristics of nanopatterning on photoresist using a near-field scanning optical microscope with an He-Cd laser [5662-09]
International symposium; 5th, Fifth international symposium on laser precision microfabrication ; 2004 ; Nara, Japan
2004-01-01
5 pages
Also known as LPM 2004.
Aufsatz (Konferenz)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Lithography in UV photoresist using NSOM [5662-13]
British Library Conference Proceedings | 2004
|The dry laser cleaning of photoresist residues on Si and ITO substrate [5662-75]
British Library Conference Proceedings | 2004
|Laser machinable glass [5662-06]
British Library Conference Proceedings | 2004
|Laser micromachining of optical devices (Invited Paper) [5662-84]
British Library Conference Proceedings | 2004
|Three-dimensional laser microfabrication (Plenary Paper) [5662-01]
British Library Conference Proceedings | 2004
|