Zugriff

    Zugriff über TIB

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    In Situ Thickness Monitoring and Adjusting During MBE Growth for 980 nm VCSEL



    Kongress:

    Annual meeting; 9th, IEEE: Lasers and Electro-Optics Society; LEOS '96; 9th annual meeting ; 1996 ; Boston; MA



    Erscheinungsdatum :

    1996-01-01


    Format / Umfang :

    2 pages


    Anmerkungen:

    Described as proceedings. IEEE cat no: 96CH35895



    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    In situ thickness monitoring and adjusting during MBE growth for VCSEL

    Zhong Pan, / Zengqi Zhou, / Yaowang Lin, et al. | IEEE | 1996


    In Situ Thickness Monitoring and Adjusting During MBE Growth for VCSEL

    IEEE; Lasers and Electro-Optics Society | British Library Conference Proceedings | 1996


    In situ thickness monitoring and adjusting during MBE growth for 980 nm VCSEL

    Zhong Pan, / Zengqi Zhou, / Zhichan Niu, et al. | IEEE | 1996


    Manufacturability of VCSEL Components and VCSEL Products

    IEEE; Lasers and Electro-Optics Society | British Library Conference Proceedings | 1998


    WDM VCSEL Array Fabricated by MOCVD Growth

    IEEE; Lasers and Electro-Optics Society | British Library Conference Proceedings | 1998