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    Titel :

    Reactive ion etching (RIE) control by optical emission endpoint detection in IR focal plane array production [2228-31]



    Kongress:

    Conference, Producibility of II-VI materials and devices ; 1994 ; Orlando; FL



    Erscheinungsdatum :

    1994-01-01


    Format / Umfang :

    8 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Automated radiometric cryoprobe of IR focal plane array wafers [2228-29]

    Whicker, S. L. / SPIE | British Library Conference Proceedings | 1994


    Producibility of Vertically Integrated Photodiode (VIP)[TM] scanning focal plane arrays [2228-24]

    Turner, A. M. / Teherani, T. / Ehmke, J. C. et al. | British Library Conference Proceedings | 1994


    Self-aligned molecular beam epitaxy of CdZnTe for IR focal plane arrays [2228-06]

    Dhar, N. K. / Boyd, P. R. / Amirtharaj, P. M. et al. | British Library Conference Proceedings | 1994


    Monograin A2B6 powders [2228-19]

    Mellikov, E. / Hiie, J. / Altosaar, M. et al. | British Library Conference Proceedings | 1994


    Ultrafast molecular beam epitaxy (MBE) CdTe photoconductor array for synchrotron radiation [2228-21]

    Yoo, S. S. / Rodricks, B. G. / Sivananthan, S. et al. | British Library Conference Proceedings | 1994