Two surface treatment processes under development at Harwell are described which make increasing use of the throwing power and versatility of ion beams. At low plasma discharge energies ionised atoms cause sputter cleaning of surfaces and enable fully dense and adherent coatings to be built up on complex industrial items. Ion implantation, in which the bombarding atoms are accelerated through typically 30 KV, causes the original surface to become heavily impregnated with ions. The reproducibility and relative ease of scaling up make both processes attractive for large volume automatic surface treatment, although the vacuum requirements for ion implantation are more stringent. Some examples taken from recent evaluations on components treated for corrosion and wear resistance in the aerospace and other industries are described. (Wassmann)


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    Title :

    Physical vapour deposition and ion beam techniques for surface durability


    Additional title:

    Aufdampf- und Elektronenstrahlverfahren zur Erhoehung der Oberflaechenfestigkeit


    Contributors:
    Coad, J.P. (author) / Hartley, E.W. (author)


    Publication date :

    1978


    Size :

    9 Seiten, 9 Bilder, 1 Tabelle, 16 Quellen


    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English