The fabrication of a range of computer-generated holographic optical elements by means of electron beam lithography is described. These elements can be considered as the combination of two overlapped cylindrical diffractive optical elements of the same focal length. The imaging properties of both orthogonal and non-orthogonal combinations are discussed. These elements produce sets of line foci at different distances and orientations determined by the angle between the two cylindrical elements. The detailed features of the line foci, 'macro- and micro-beading' can be related to the structure of the combined gratings. Equations identifying the locations of the foci are presented, and these suggest a distance measuring technique which might be applicable to machine vision.


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    Title :

    Electron beam lithographic fabrication of computer-generated holograms


    Contributors:

    Conference:

    Holographic Optics III: Principles and Applications ; 1991 ; The Hague,Netherlands


    Published in:

    Publication date :

    1991-09-01





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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