In case of metallic hole arrays we need to establish how structures transmit, reflect and absorb light. We fabricated hole arrays using a focused ion beam etching system (FBI DB235). The period of the array was 430/spl plusmn/5 nm, the hole diameter 250/spl plusmn/5 nm and the thickness of the silver 180/spl plusmn/5 nm. We made arrays with relatively large dimensions, 1 mm/sup 2/ so as to make the measurement of the reflectivity possible with existing facilities. We next performed optical measurements to find the transmittance and the reflectivity as a function of incident angle and incident frequency. In this way we are able to build up a map of the dispersion of the surface plasmon (SP) modes associated with the enhanced transmission.


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    Title :

    Transmission, reflection and absorption of light incident on metallic hole arrays


    Contributors:
    Barnes, W.L. (author) / Devaux, E. (author) / Lezec, H.J. (author) / Ebbesen, T.W. (author)


    Publication date :

    2003-01-01


    Size :

    96226 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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