We demonstrate an optical-gradient bottom antireflective coating film, which is prepared by a silicon nitride film treated with oxygen plasma. Results indicate that the optical-gradient type film is suitable for sub-70 nm optical lithography applications.


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    Title :

    Optical-gradient type of antireflective coatings for sub-70 nm optical lithography applications


    Contributors:
    Chen, H.L. (author) / Wonder Fan, (author) / Wang, T.J. (author) / Ko, F.H. (author) / Zhai, R.S. (author) / Hsu, C.K. (author) / Chuang, T.J. (author)


    Publication date :

    2003-01-01


    Size :

    70422 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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