Prototyped XY-stages driving electron beam (EB) writing system is developed to research the possibility to write fine patterns. High density optical recording pattern with 25 Gbit/in/sup 2/ is demonstrated. It is also clear that EB writing (drawing) system has a potential to achieve a required fine pattern for 100 Gbit/in/sup 2/.


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    Title :

    Prototyped XY stages driving EB mastering for a high density optical recording


    Contributors:
    Hosaka, S. (author) / Koyanagi, H. (author) / Katoh, K. (author) / Isshiki, F. (author) / Suzuki, T. (author) / Miyamoto, M. (author) / Miyauchi, Y. (author) / Arimoto, A. (author) / Nishida, T. (author)


    Publication date :

    2001-01-01


    Size :

    195274 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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