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    Title :

    Mask and source optimization for lithographic imaging systems [5182-12]


    Contributors:

    Conference:

    Conference; 2nd, Wave-optical systems engineering; Wave-optical systems engineering II



    Publication date :

    2003-01-01


    Size :

    15 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Lithographic image simulation for the 21st century with 19th-century tools (Invited Paper) [5182-11]

    Gordon, R. L. / Rosenbluth, A. E. / SPIE | British Library Conference Proceedings | 2003


    Investigation of multimode dispersionless beams [5182-17]

    Pavelyev, V. S. / Soifer, V. A. / Duparre, M. R. et al. | British Library Conference Proceedings | 2003


    A Highly Formable Aluminum Alloy-5182-SSF

    Thompson, David S. | SAE Technical Papers | 1977


    Optical scanning cryptography (Invited Paper) [5182-27]

    Poon, T.-C. / SPIE | British Library Conference Proceedings | 2003


    Comments on wave-optical engineering [5182-01]

    Wyrowski, F. / Schimmel, H. / Buhling, S. et al. | British Library Conference Proceedings | 2003