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    Title :

    Crystallization of 500-nm-thick a-SiGe:H films through ArF-excimer laser radiation [5147-24]


    Contributors:
    Chiussi, S. (author) / Fabbri, F. (author) / Fornarini, L. (author) / Gonzalez, P. (author) / Leon, B. (author) / Martelli, S. (author) / Lopez, E. (author) / Serra, C. (author) / Serra, J. (author) / Weber, Heinz PDan C

    Conference:

    International conference, Advanced laser technologies; ALT '02



    Publication date :

    2003-01-01


    Size :

    8 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




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