X-ray investigation of the relaxation and diffusion behavior of strained SiGe/Si structures under hydrostatic pressure at high temperatures [3179-32]
Symposium; 12th, Solid state crystals: materials science and applications: Solid state crystals in opteolectronics and semiconductor technology ; 1996 ; Zakopane; Poland
Solid state crystals: materials science and applications: Solid state crystals in opteolectronics and semiconductor technology ; 3179 ; 172-175
1996-01-01
4 pages
Also known as SSCs'96
Conference paper
English
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