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keywords:(semiconductor industries)
Quasi-confocal extended field surface sensing [4449-23]
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
Polarized light scattering from metallic particles on silicon wafers [4449-39]
Measurement of the elastic constants of nanometric films [4449-16]
Optical microscopy at sub-0.1-mum resolution for semiconductor applications [4099-03]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
X-ray study of surfaces and interfaces [4449-31]
Effects of particle shape on particle identification and scatter predictions [4449-18]
Stitching interferometry of aspherical surfaces [4449-34]