New type of Monk-Gillieson monochromator capable of covering a 0.7- to 25-nm range [4782-41]
Temperature-dependence perturbations on LTP measurements [4782-04]
Microstructure of Mo/Si multilayers with barrier layers [4782-25]
Wideband multilayer mirrors for medium to hard x-ray applications [4782-23]
New process for x-ray mirror image quality improvement [4782-06]
Wave-optical analysis of submicron focusing of hard x-ray beams by reflective optics [4782-36]
Toroidal mirror for single-pulse experiments on ID09B [4782-18]
Topography measurement of nanometer synchrotron optics [4782-02]
Status of small d-spacing x-ray multilayer development at Osmic [4782-21]
Nickel-plated invar mirrors for synchrotron radiation beam lines [4782-12]
The present state of Kirkpatrick-Baez mirror systems at the ESRF [4782-10]
Profile coating of KB mirrors at the Advanced Photon Source [4782-13]