1–20 von 42 Ergebnissen
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    Atomic Force Microscopy: AFM helps engineer low-scatter thin films

    Duparre, A. / Kaiser, N. | British Library Online Contents | 1998

    Funktionsrelevante Rauheitsanalyse durch kombinative Verfahren

    Duparre,A. / Fraunhofer Inst.f.Angewandte Optik u.Feinmechanik,IOF,Jena,DE | Kraftfahrwesen | 2012

    DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]

    Gliech, S. / Steinert, J. / Flemming, M. et al. | British Library Conference Proceedings | 2000

    Characterization procedures for nanorough ultrahydrophobic surfaces with controlled optical matter [5188-30]

    Flemming, M. / Reihs, K. / Duparre, A. et al. | British Library Conference Proceedings | 2003

    Wide-scale surface measurement using white light interferometry and atomic force microscopy [3479-04]

    Recknagel, R.-J. / Feigl, T. / Duparre, A. et al. | British Library Conference Proceedings | 1998

    Advanced methods for surface and subsurface defect characterization of optical components [4099-34]

    Steinert, J. / Gliech, S. / Wuttig, A. et al. | British Library Conference Proceedings | 2000

    VUV light-scattering measurements of substrates and thin film coatings [5188-14]

    Hultaker, A. / Gliech, S. / Benkert, N. et al. | British Library Conference Proceedings | 2003

    Microroughness analysis of thin film components for VUV applications [4099-13]

    Ferre-Borrull, J. / Duparre, A. / Steinert, J. et al. | British Library Conference Proceedings | 2000

    New procedure for the optical characterization of high-quality thin films [4099-16]

    Bosch, S. / Leinfellner, N. / Quesnel, E. et al. | British Library Conference Proceedings | 2000

    AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]

    Frost, F. / Hirsch, D. / Schindler, A. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    Measuring the scatter distribution of PSL spheres on Si wafers using a fast calibrated CMOS photodetector array [4449-20]

    Rinder, T. / Rothe, H. / SPIE | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    Polarized light scattering from metallic particles on silicon wafers [4449-39]

    Kim, J. H. / Ehrman, S. H. / Mulholland, G. W. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    Measurement of the elastic constants of nanometric films [4449-16]

    Beghi, M. G. / Bottani, C. E. / Bassi, A. L. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    Diffractive solid immersion lenses: characterization and manufacturing [4449-29]

    Brunner, R. / Bischoff, J. / Rudolf, K. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm [4449-06]

    Boher, P. / Evrard, P. / Piel, J. P. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]

    Weingartner, I. / Schulz, M. / Thomsen-Schmidt, P. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]

    Boher, P. / Bucchia, M. / Piel, J. P. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    Present and future industrial metrology needs for qualification of high-quality optical microlithography materials (Invited Paper) [4449-01]

    Engel, A. / Morsen, E. / Jordanov, A. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.

    Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool [4449-10]

    Boher, P. / Piel, J. P. / Stehle, J. L. et al. | British Library Conference Proceedings | 2001
    Beteiligte: Duparre, A.