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Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
Present and future interference microscope systems for magnetic head metrology [4099-21]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]
Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]
Calibration tool for a CCD-camera-based vision system [4099-19]
DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
New procedure for the optical characterization of high-quality thin films [4099-16]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
Investigation on total scattering at 157 nm and 193 nm [4099-09]
Calibration requirements for identifying and sizing wafer defects by scanner measurements [4099-38]
Fast-scanning ellipsometry for thin film characterization [4099-39]