1–20 von 29 Ergebnissen
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    New imaging technique for 64M-DRAM

    Shiraishi, Naomasa / Hirukawa, Shigeru / Takeuchi, Yuichiro et al. | SPIE | 1992

    Novel ARC optimization methodology for KrF excimer laser lithography at low K1 factor

    Ogawa, Tohru / Kimura, Mitsumori / Tomo, Yoichi et al. | SPIE | 1992

    High-performance wafer stage: simplification delivers performance

    Cameron, John F. / Seto, Jacqueline A. / Wise, Lawrence A. | SPIE | 1992

    Advanced krypton fluoride excimer laser for microlithography

    Ishihara, Toshihiko / Sandstrom, Richard L. / Reiser, Christopher et al. | SPIE | 1992

    Fundamental differences between positive- and negative-tone imaging

    Mack, Chris A. / Connors, James E. | SPIE | 1992

    Conjugate twin-shifter masks with multiple focal planes

    Ohtsuka, Hiroshi / Onodera, Toshio / Kuwahara, Kazuyuki et al. | SPIE | 1992

    New antireflective layer for deep-UV lithography

    Suda, Yurika / Motoyama, Takushi / Harada, Hideki et al. | SPIE | 1992

    Small-field stepper for 193-nm lithography process development

    Shaver, David C. / Craig, David M. / Marchi, C. A. et al. | SPIE | 1992

    Chromeless phase mask by resist silylation

    Bauch, Lothar / Bauer, Joachim J. / Dreger, Helge H. et al. | SPIE | 1992

    Effect of chromatic aberration in excimer laser lithography

    Yan, Pei-yang / Qian, Qi-De / Langston, Joseph C. et al. | SPIE | 1992

    Polarization effects in mask transmission

    Wong, Alfred K. K. / Neureuther, Andrew R. | SPIE | 1992

    Solid state laser for photolithography

    Andreev, Nikolay / Babin, A. A. / Bityurin, Nikita M. et al. | SPIE | 1992

    Strategies for deep-UV patterning of half-micron contacts using negative photoresists

    Jones, Susan K. / Capsuto, Elliott S. / Dudley, Bruce W. et al. | SPIE | 1992

    Lithographic alternatives to PSM repair

    Rieger, Michael L. / Buck, Peter D. / Shaw, Mark | SPIE | 1992

    Narrow band KrF excimer laser for mass production of ULSI ICs

    Mizoguchi, Hakaru / Wakabayashi, Osamu / Ito, Noritoshi et al. | SPIE | 1992

    Using multiple focal planes to enhance depth of focus

    Spence, Chris A. / Cole, Daniel C. / Peck, Barbara | SPIE | 1992

    Two-dimensional high-resolution stepper image monitor

    Pfau, Anton K. / Hsu, Richard / Oldham, William G. | SPIE | 1992

    Laser-induced damage in pellicles at 193 nm

    Rothschild, Mordechai / Sedlacek, Jan H. C. | SPIE | 1992

    Novel laser microlithography system

    Shen, Guan-Qun / Wu, Binchu / Cai, Kangzhe et al. | SPIE | 1992