A process for generating a controlled surface profile of the etched or coated material without the need for application of a mask has been developed and tested. A special etching fixture is used to obtain the desired etching profile. Depending on the fixture geometry, the etched profile may constitute sharp transitions or be gradually modulated, with gradual, well controlled transitions and no sharp boundaries. The process is based on limiting, in a controlled manner, the transport and available volume of the etchant. A mathematical model for the process has been developed. The model has been quantitatively verified through a series of experiments. The capability of applying the process to generate gradually modulated etched aluminum oxide layers has been demonstrated. The technique can provide the basis for an 'out of tank' repair process employing gradual chemical etching and re-anodization. This may provide a feasible route to repairing damaged aluminum oxide layers.


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    Titel :

    A novel process for etching modulated profiles


    Weitere Titelangaben:

    Ein neuartiges Verfahren zum Ätzen modulierter Profile


    Beteiligte:
    Sporer, R.W. (Autor:in) / Landau, U. (Autor:in) / Kuo, Hong-Hsiang Harry (Autor:in) / Wang, Yar-Ming (Autor:in)


    Erscheinungsdatum :

    2009


    Format / Umfang :

    18 Seiten, 20 Bilder, 1 Tabelle, 10 Quellen




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




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