Nextel 480/Silica Composite was manufactured by APCVI (Atmosphere Pressure Chemical Vapor Infiltration). Addition of O2 is very important in Nextel/Silica Composite manufacturing process. The Nextel 480/Silica Composite has higher flexural strength and higher loss factor without addition of O2. That is attributed to the remaining C. The Nextel 480/Silica Composite has lower flexural strength and appropriate loss factor by addition of O2 during CVI. For CVD of silica, the deposition rate was affected by TEOS partial, O2 partial and deposition temperature. Experiments results show that the deposition rate also was affected by the reactor inner diameter. This means the deposition rate was controlled by mass transport of the reactants in the gas phase. When the deposition temperature higher, the deposition rate higher during CVD. The increase of deposition temperature results in a rapid deposition rate and could lead to an increase of SiO2 aggregates size. Rapid deposition and bigger SiO2 aggregates could make the diffusion become very difficulty and generate bottleneck effect. The appropriate temperature during CVI is 750 deg C. The silica matrix gotten by CVI has good thermal matches with the Nextel 480 fiber.


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    Titel :

    Nextel 480/silica composites by atmosphere pressure chemical vapor infiltration


    Beteiligte:
    Chen, Z. (Autor:in) / Zhang, L. (Autor:in) / Cheng, L. (Autor:in) / Xu, Y. (Autor:in) / Gao, R. (Autor:in)


    Erscheinungsdatum :

    2001


    Format / Umfang :

    6 Seiten, 6 Bilder, 8 Quellen




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




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