A process for producing a selective emittance coating for aluminium surfaces is discussed. Standard photoresist techniques are used to produce a uniform dot pattern. Emittance and reflectance are controlled by varying the ratio of anodized dot area to bare aluminium area. Process parameters, scale-up, effect of forming operations, theoretical values, and experimental data are presented. (Kursetz)
Anodized dots variable emittance coating
Variable Abstrahlungsschichten mit anodisierten Fleckenmustern
1979
6 Seiten, 6 Bilder
Aufsatz (Konferenz)
Englisch
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