The generation of phase-shifted gratings in InP for DFB lasers by holographic double exposure is described. The method is also suited for maskless laser activated etching. An estimation of the DFB laser threshold as compared to the ideal phase-shifted grating with constant amplitude is given.


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    Titel :

    Phase-Shifted Holographic Gratings For Distributed Feedback Lasers


    Beteiligte:
    Heise, Gerhard (Autor:in) / Matz, Richard (Autor:in) / Wolff, Ulrich (Autor:in)

    Kongress:

    Integrated Optical Circuit Engineering III ; 1986 ; Innsbruck,Austria


    Erschienen in:

    Erscheinungsdatum :

    1986-11-03





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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