This paper presents the development of a floating-element shear stress sensor that permits the direct measurement of skin friction based on geometric Moir interferometry. The sensor was fabricated using an aligned wafer-bond/thin-back process producing optical gratings on the backside of a floating element and on the top surface of the support wafer. Experimental characterization indicates a static sensitivity of 0.26 microns/Pa, a resonant frequency of 1.7 kHz, and a noise floor of 6.2 mPa/(square root)Hz.


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    Titel :

    A Micromachined Geometric Moire Interferometric Floating-Element Shear Stress Sensor


    Beteiligte:
    Horowitz, S. (Autor:in) / Chen, T. (Autor:in) / Chandrasekaran, V. (Autor:in) / Tedjojuwono, K. (Autor:in) / Nishida, T. (Autor:in) / Cattafesta, L. (Autor:in) / Sheplak, M. (Autor:in)

    Kongress:

    42nd AIAA Aerospace Sciences Meeting ; 2008 ; Reno, NV, United States


    Erscheinungsdatum :

    2004-01-05


    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :


    A Micromachined Geometric Moiré Interferometric Floating-Element Shear Stress Sensor

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