Multilayer badges devised to provide rapid, in-place indications of ion sputter etch rates. Badges conceived for use in estimating ion erosion of molybdenum electrodes used in inert-gas ion thrustors. Concept adapted to measure ion erosion in industrial sputter etching processes used for manufacturing of magnetic, electronic, and optical devices. Badge etched when bombarded by energetic ions. Badge layers exposed using mask. Contrast between layers facilitates counting of layers to determine etch depth.


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    Titel :

    Multilayer Badges Indicate Depths Of Ion Sputter Etches


    Beteiligte:
    Beattie, J. R. (Autor:in) / Matossian, J. N. (Autor:in) / Garvin, H. L. (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    01.07.1994



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :



    Ultraviolet etches transparent dielectrics

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