Monolithic photovoltaic batteries containing vertical cells include buried CoSi(2) contact layers. Vertical-junction photovoltaic cells in series fabricated in monolithic structure. N- and p-doped silicon layers deposited epitaxially. The CoSi(2) layers, formed by ion implantation and annealing, serve as thin, low-resistance ohmic contacts between cells.


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    Titel :

    Making CoSi(2) Layers By Ion Implantation


    Beteiligte:

    Erschienen in:

    Erscheinungsdatum :

    01.01.1994



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch






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