Masks of improved design developed for use in fabrication of aspherical, rotationally symmetrical surfaces of mirrors, lenses, and lens molds by evaporative deposition onto rotating substrates. In deposition chamber, source and mask aligned with axis of rotation of substrate. Mask shadows source of rotating substrate. Azimuthal opening (as function of radius) in mask proportional to desired thickness (as function of radius) to which material deposited on substrate. Combination of improved masks and modern coating chambers provides optical surfaces comparable or superior to those produced by conventional polishing, computer-controlled polishing, replication from polished molds, and diamond turning, at less cost in material, labor, and capital expense.


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    Titel :

    Masks For Deposition Of Aspherical Optical Surfaces


    Beteiligte:
    Rogers, John R. (Autor:in) / Martin, John D. (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    01.07.1992



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :


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    Stitching interferometry of aspherical surfaces [4449-34]

    Hansel, T. / Nickel, A. / Schindler, A. et al. | British Library Conference Proceedings | 2001


    Fabricating aspherical lenses

    Fahnle, O. | British Library Online Contents | 2011


    Inexpensive Masks for Film Deposition

    Conley, W. R. | NTRS | 1986


    On the preparation of high reflectance aspherical mirrors by thin-film deposition

    Jaing, C.-C. / Lee, C.-C. | British Library Online Contents | 1996