New chemical-vapor deposition (CVD) process developed for fabricating lightweight Si/SiC mirrors. Process involves three CVD steps: to produce faceplate of mirror; to form lightweight back structure deposited integrally with faceplate; and to deposit layer of optical-grade material onto front surface of faceplate. Figure and finish of mirror fabricated into this latter material. Produces dense, highly pure polycrystalline materials polished to surface figures of high precision and finish.
Fabrication Of Lightweight Mirrors Via CVD
NASA Tech Briefs ; 15 , 6
1991-06-01
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Englisch
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