In experiments described in report, amorphous hydrogenated carbon films grown at room temperature by low-frequency plasma deposition, using methane or butane gas. Films have unique array of useful properties; (a) adhere to wide variety of materials; (b) contain only carbon and hydrogen; (c) smooth and free of pinholes; (d) resistant to attack by moisture and chemicals; and (e) have high electric-breakdown strength and electrical resistivity. Two of optical properties and hardness of this film controlled by deposition conditions. Amorphous a-C:H and BN films used for hermetic sealing and protection of optical, electronic, magnetic, or delicate mechanical systems, and for semiconductor field dielectrics.
Amorphous Insulator Films With Controllable Properties
NASA Tech Briefs ; 11 , 9
1987-10-01
Sonstige
Keine Angabe
Englisch
ACTIVE OPACITY CONTROLLABLE THIN FILMS FOR WINDSHIELDS
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