X-ray photoelectron spectroscopy (XPS) is analytical technique for understanding electronic structure of atoms close to surface in solids, in preference to bulk structure of material. Study found evidence for core-level chemical shifts arising from changes in local structural environment in amorphous SiO2 and at Si/SiO2 interface. Observed XPS spectra may be understood as sequential convolution of several functions, each with well-defined physical interpretation.
XPS Study of SiO2 and the Si/SiO2 Interface
NASA Tech Briefs ; 6 , 3
1982-12-01
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Englisch
Surface passivation at a SiO2-n+-layer interface
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