Using 3D-FDTD computations, photonic band gap properties of materials which can be fabricated by an innovative atomic layer deposition (ALD) technique was presented. Non-sintered synthetic opal was conformally infiltrated with a buffer material that can be selectively etched, and a high refractive index material subsequently infiltrated onto the buffer layer up to the maximum infiltration of 86%. After complete chemical removal of the dielectric spheres and sacrificial layer, the inverse structure can be backfilled so that a high refractive index material conforms to the interior geometry of the remaining backbone.
Highly tunable photonic band gap in inverse shell non-close-packed structures
01.01.2005
175795 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
Highly Tunable Photonic Band Gap in Inverse Shell Non-Close-Packed Structures
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